Frame-supported dustproof pellicle for photolithographic photomask
US5834143A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1996 |
| Grant date | Nov 10, 1998 |
| Priority date | — |
| Expiry date | Nov 21, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is partly subjected to smoothing treatment. The inventive frame-supported pellicle can solve the heretofore unavoidable problems of dust particle deposition on the photomask even under dustproof protection with a pellicle as well as the high cost of the preparation of the pellicle and the difficulty of finding of any dust particles deposited on the surface of the frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.