Plasma processing equipment and gas discharging device
US5834730A · kind A · utility
18Cited by
5References
23Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 31, 1997 |
| Grant date | Nov 10, 1998 |
| Priority date | — |
| Expiry date | Jan 31, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas discharging device is provided which has a function as one of opposing electrodes to plasmanize a reaction gas and executes film formation and etching with a plasma gas. The device comprises a base body having a recess portion at its central portion and a through-hole for introducing a gas into the recess portion, a gas distributing plate provided in the recess portion for introducing the gas in a radial direction, and an annular gas discharging member for discharging the gas introduced by the gas distributing plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.