Phase shifting mask having a phase shift that minimizes critical dimension sensitivity to manufacturing and process variance
US5840448A · kind A · utility
18Cited by
3References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 31, 1996 |
| Grant date | Nov 24, 1998 |
| Priority date | — |
| Expiry date | Dec 31, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reticle having only one phase delay value for a given wavelength of incident radiation. The reticle includes a first and second region, both transparent to incident radiation. The second region being adjacent to said first region. The incident radiation transmitted by the second region has a phase delay of other than an integer multiple of 90 degrees relative to said incident radiation transmitted by the first region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.