Method and apparatus for improved temperature control in rapid thermal processing (RTP) systems
US5841110A · kind A · utility
45Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1997 |
| Grant date | Nov 24, 1998 |
| Priority date | — |
| Expiry date | Aug 27, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2101/40
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method for Rapid Thermal Processing (RTP) is presented, wherein the broadband reflectivity of an object is measured, and the results of the measurement used by the RTP system to adjust the RTP system parameters used in processing the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.