Sulfonium salts and chemically amplified positive resist compositions
US5847218A · kind A · utility
18Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1997 |
| Grant date | Dec 8, 1998 |
| Priority date | — |
| Expiry date | Mar 4, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The invention provides a novel sulfonium salt having a substituted or unsubstituted arylsulfonate anion. The novel sulfonium salt minimizes the influence of deactivation by basic compounds not only at a resist surface, but also at a resist-substrate interface, assists a resist to be configured to a definite pattern profile. When the sulfonium salt has an acid labile group, it is effective for increasing the dissolution contrast between exposed and unexposed areas. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.