Shigehiro Nagura
61Patents
18h-index
55Co-inventors
87Inventor score
Filing activity: Dec 14, 1984 → Sep 1, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6830866B2 | Resist composition and patterning process | Physics | 51 | Expired |
| US6440634B1 | Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process | Emerging Cross-Sectional Technologies | 50 | Expired |
| US5972560A | High molecular weight silicone compound, chemically amplified positive resist composition and patterning method | Physics | 50 | Expired |
| US5942367A | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group | Emerging Cross-Sectional Technologies | 46 | Expired |
| US6048661A | Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation | Emerging Cross-Sectional Technologies | 43 | Expired |
| US5876900A | Chemically amplified positive resist composition | Emerging Cross-Sectional Technologies | 41 | Expired |
| US4923119A | Sustained-release pheromone dispenser | Performing Operations; Transporting | 36 | Expired |
| US4689267A | Composite hollow fiber | Emerging Cross-Sectional Technologies | 34 | Expired |
| US5882844A | Chemically amplified positive resist composition | Physics | 31 | Expired |
| US6309796A | High molecular weight silicone compounds resist compositions, and patterning method | Physics | 29 | Expired |
| US5880169A | Sulfonium salts and chemically amplified positive resist compositions | Physics | 28 | Expired |
| US6106993A | Chemically amplified positive resist composition | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6274286A | Resist compositions | Emerging Cross-Sectional Technologies | 24 | Expired |
| US5849461A | Chemically amplified positive resist composition | Physics | 24 | Expired |
| US6730453B2 | High molecular weight silicone compounds, resist compositions, and patterning method | Physics | 23 | Expired |
| US5750309A | Chemically amplified positive resist composition | Emerging Cross-Sectional Technologies | 21 | Expired |
| US4761436A | Contact lens comprising triorganovinylsilane polymers | Physics | 21 | Expired |
| US5824824A | Sulfonium salts and chemically amplified positive resist compositions | Emerging Cross-Sectional Technologies | 19 | Expired |
| US5847218A | Sulfonium salts and chemically amplified positive resist compositions | Physics | 18 | Expired |
| US6338931B1 | Resist compositions and patterning process | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6416928B1 | Onium salts, photoacid generators, resist compositions, and patterning process | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6156477A | Polymers and chemically amplified positive resist compositions | Emerging Cross-Sectional Technologies | 15 | Expired |
| US5583244A | Siloxane-containing pullulan and method for the preparation thereof | Chemistry; Metallurgy | 14 | Expired |
| US5416206A | Modified xanthan gum and method for modifying xanthan gum | Chemistry; Metallurgy | 14 | Expired |
| US6027854A | Polymers chemically amplified positive resist compositions, and patterning method | Emerging Cross-Sectional Technologies | 14 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.