X-ray mask blank, X-ray mask and pattern transfer method
US5848120A · kind A · utility
2Cited by
2References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 1997 |
| Grant date | Dec 8, 1998 |
| Priority date | — |
| Expiry date | Sep 4, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is provided an X-ray mask blank from which an X-ray mask having a remarkably small positional deformation even at a large window size of 50 mm square and a remarkably positional precision can be manufactured. The X-mask blank has an X-ray transparent film on a substrate and an X-ray absorber film on the X-ray transparent film. A product of Young modulus and film thickness of the X-ray transparent film is 6.times.10.sup.8 to 3.times.10.sup.9 dyn/cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.