Tsutomu Shoki
76Patents
7h-index
23Co-inventors
72Inventor score
Filing activity: Mar 21, 1997 → May 31, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7390596B2 | Reflection type mask blank and reflection type mask and production methods for them | Emerging Cross-Sectional Technologies | 28 | Expired |
| US6128363A | X-ray mask blank, x-ray mask, and pattern transfer method | Physics | 11 | Expired |
| US6737201B2 | Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device | Physics | 9 | Expired |
| US6127068A | X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, manufacturing method thereof and method of polishing silicon carbide film | Physics | 9 | Expired |
| US10481484B2 | Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor device | Chemistry; Metallurgy | 9 | Active |
| US8512918B2 | Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same | Physics | 9 | Active |
| US9864267B2 | Reflective mask blank, reflective mask, and method for manufacturing semiconductor device | Chemistry; Metallurgy | 7 | Active |
| US8372564B2 | Reflective mask, reflective mask blank and method of manufacturing reflective mask | Physics | 6 | Active |
| US9195131B2 | Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same | Physics | 6 | Active |
| US6749973B2 | Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask | Physics | 5 | Expired |
| US10001699B2 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method | Chemistry; Metallurgy | 5 | Active |
| US7056627B2 | Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask | Chemistry; Metallurgy | 5 | Expired |
| US7981573B2 | Reflective mask blank, reflective mask and methods of producing the mask blank and the mask | Emerging Cross-Sectional Technologies | 5 | Active |
| US5989755A | Method of manufacturing x-ray mask blank and method of manufacturing x-ray membrane for x-ray mask | Physics | 4 | Expired |
| US6797368B2 | Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5958627A | X-ray mask blank and method of manufacturing the same | Emerging Cross-Sectional Technologies | 3 | Expired |
| US9377679B2 | Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device | Physics | 3 | Active |
| US7314688B2 | Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device | Performing Operations; Transporting | 3 | Expired |
| US6366640B1 | X-ray mask blank, X-ray mask and method for manufacturing the same | Physics | 3 | Expired |
| US11531264B2 | Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method | Physics | 2 | Active |
| US11480867B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Physics | 2 | Active |
| US11003068B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Physics | 2 | Active |
| US5848120A | X-ray mask blank, X-ray mask and pattern transfer method | Physics | 2 | Expired |
| US8367279B2 | Reflective mask blank, reflective mask, and method of manufacturing the same | Physics | 2 | Active |
| US5999590A | X-ray mask blank and manufacturing method for the same, and manufacturing method for X-ray mask | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.