Photosensitive titanium carboxydiketonate and titanium carboxyketoester precursor solutions and method of patterning integrated circuits using the same
US5849465A · kind A · utility
11Cited by
4References
18Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Nov 8, 1996 |
| Grant date | Dec 15, 1998 |
| Priority date | — |
| Expiry date | Nov 8, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/148
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive liquid precursor solution including titanium carboxyketoesters or titanium carboxydiketonates polymerizes upon exposure to ultraviolet radiation. The solution is applied to an integrated circuit substrate, masked, and exposed to ultraviolet radiation to pattern the liquid precursor film. Unexposed portions of the film are removed in a developer solution including alcohol and water. The remaining portion of the film constitutes a pattern that may be annealed to form a metal oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.