Photosensitive polymers and photoresist compositions containing the same
US5851727A · kind A · utility
23Cited by
7References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 30, 1997 |
| Grant date | Dec 22, 1998 |
| Priority date | — |
| Expiry date | May 30, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Photosensitive polymers are represented by the formula: ##STR1## wherein R1 is selected from the group consisting of hydrogen and methyl; R2 is selected from the group consisting of aliphatic hydrocarbon groups having from 6 to 20 carbon atoms; R3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9. Photoresist compositions comprise the photosensitive polymers and photoacid generators.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.