Resist material including si-containing resist having acid removable group combined with photo-acid generator
US5856071A · kind A · utility
11Cited by
6References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1996 |
| Grant date | Jan 5, 1999 |
| Priority date | — |
| Expiry date | Mar 18, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A fine pattern is formed using a resist material including a copolymer of a silicon-containing acrylate and an acrylate which contains a group that is eliminated by an acid, and a photo-acid generator which generates the acid upon irradiation. The polarity of the material changes after elimination of this group and becomes soluble in an aqueous alkali solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.