Device for surface coating or lacquering of substrates
US5863328A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1997 |
| Grant date | Jan 26, 1999 |
| Priority date | — |
| Expiry date | Feb 18, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for surface coating or for lacquering of a substrate, such as a disk-shaped substrate 2, which can be placed on a substrate support 14 and can be driven or made to perform a rotating movement, wherein the medium to be applied or the lacquer fluid is applied to the substrate 2 via a feed device 6 which can be displaced in relation to the substrate 2 and/or can be driven. The substrate 2 or the substrate support 14 can be displaced by means of a guide device or in a connecting link guide 7 in such a way that in the area of the substrate 2 the feed device 6 for applying the fluid or the lacquer is conducted approximately parallel with the surface of the substrate 2 and can be stopped at any arbitrary point above the substrate 2 at an even height distance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.