Diamond film deposition
US5863605A · kind A · utility
44Cited by
14References
32Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 12, 1997 |
| Grant date | Jan 26, 1999 |
| Priority date | — |
| Expiry date | Feb 12, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/0272
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing a diamond film is disclosed, which comprises the steps of providing a substrate having a Young's modulus of less than 50 GPa; applying a coating material comprising a glass-forming oxide binder and diamond grit to the substrate; and depositing said diamond film on said coating by CVD.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.