Electrochemical etching apparatus and method for spirally etching a workpiece
US5865984A · kind A · utility
24Cited by
9References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1997 |
| Grant date | Feb 2, 1999 |
| Priority date | — |
| Expiry date | Jun 30, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25F7/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is an electrochemical etching apparatus including a fixture for holding a workpiece; a nozzle, positioned opposite the fixture and facing the workpiece, for impinging an etchant onto the workpiece; and an electrode for applying a voltage between the electrode and the workpiece; wherein, in operation, one of the fixture and nozzle are rotated and the nozzle is moved radially outwardly so that the workpiece is spirally etched. Also disclosed is a method of spirally etching a workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.