Photosensitive quinolone compounds and a process of preparation
US5866295A · kind A · utility
2Cited by
9References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1997 |
| Grant date | Feb 2, 1999 |
| Priority date | — |
| Expiry date | Mar 7, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as, photosensitive coating compositions, pharmaceuticals, agricultural, amongst others. The invention further relates to a process for making the novel photosensitive 3-diazo 2,4-quinolinedione compounds. These compounds are particularity useful as a photoactive component in a positive working photoresist composition, particularity for use as a deep ultraviolet (UV) photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.