Joseph E. Oberlander
22Patents
9h-index
45Co-inventors
71Inventor score
Filing activity: Aug 2, 1991 → Oct 24, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6844131B2 | Positive-working photoimageable bottom antireflective coating | Emerging Cross-Sectional Technologies | 57 | Expired |
| US8088548B2 | Bottom antireflective coating compositions | Physics | 54 | Active |
| US6114085A | Antireflective composition for a deep ultraviolet photoresist | Physics | 51 | Expired |
| US7824837B2 | Positive-working photoimageable bottom antireflective coating | Emerging Cross-Sectional Technologies | 45 | Active |
| US7264913B2 | Antireflective compositions for photoresists | Emerging Cross-Sectional Technologies | 11 | Expired |
| US8039202B2 | Positive-working photoimageable bottom antireflective coating | Emerging Cross-Sectional Technologies | 10 | Active |
| US5225312A | Positive photoresist containing dyes | Physics | 9 | Expired |
| US7070914B2 | Process for producing an image using a first minimum bottom antireflective coating composition | Emerging Cross-Sectional Technologies | 9 | Expired |
| US7601482B2 | Negative photoresist compositions | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6524775B1 | Edge bead remover for thick film photoresists | Physics | 8 | Expired |
| US6106995A | Antireflective coating material for photoresists | Physics | 8 | Expired |
| US5876897A | Positive photoresists containing novel photoactive compounds | Physics | 7 | Expired |
| US6368421B1 | Composition for stripping photoresist and organic materials from substrate surfaces | Physics | 7 | Expired |
| US6911293B2 | Photoresist compositions comprising acetals and ketals as solvents | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6531267B2 | Process for producing acid sensitive liquid composition containing a carbonate | Physics | 4 | Expired |
| US7754414B2 | Antireflective coating compositions | Physics | 3 | Active |
| US7078157B2 | Photosensitive composition and use thereof | Emerging Cross-Sectional Technologies | 2 | Expired |
| US5866295A | Photosensitive quinolone compounds and a process of preparation | Physics | 2 | Expired |
| US6017766A | Process for measuring concentration of nonionic surfactants in an aqueous alkaline solution | Emerging Cross-Sectional Technologies | 2 | Expired |
| US5936071A | Process for making a photoactive compound and photoresist therefrom | Physics | 0 | Expired |
| US6048665A | Process for making a photoactive compound and photoresist therefrom | Physics | 0 | Expired |
| US6077942A | Process of controlling particle size of naphthoquinone diazide esters | Chemistry; Metallurgy | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.