Stable matching networks for plasma tools
US5866985A · kind A · utility
55Cited by
8References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1996 |
| Grant date | Feb 2, 1999 |
| Priority date | — |
| Expiry date | Dec 3, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/26
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Apparatus and method for obtaining stable matching networks for plasma tools for use in the plasma processing industry. In an RF plasma apparatus, running at a matched condition for a transmission line and the plasma tool matching network such that the input impedance at the input to the transmission line is different than that of the output impedance of an RF generator and such that when the plasma density in the plasma tool decreases the input impedance will match the output impedance of the generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.