Method for removing inorganic contamination by chemical derivitization and extraction
US5868856A · kind A · utility
83Cited by
18References
11Claims
0Family size
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Key dates
| Filing date | Jul 23, 1997 |
| Grant date | Feb 9, 1999 |
| Priority date | — |
| Expiry date | Jul 23, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of removing inorganic contamination from substantially the surface of a semiconductor substrate, the method comprising the steps of: reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent is included in a first supercritical fluid (preferably supercritical CO.sub.2); and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.