Monte A. Douglas
51Patents
26h-index
16Co-inventors
85Inventor score
Filing activity: Sep 26, 1984 → Jun 29, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4807016A | Dry etch of phosphosilicate glass with selectivity to undoped oxide | Electricity | 341 | Expired |
| US4855017A | Trench etch process for a single-wafer RIE dry etch reactor | Electricity | 216 | Expired |
| US4784720A | Trench etch process for a single-wafer RIE dry etch reactor | Electricity | 143 | Expired |
| US4891303A | Trilayer microlithographic process using a silicon-based resist as the middle layer | Electricity | 140 | Expired |
| US5482564A | Method of unsticking components of micro-mechanical devices | Performing Operations; Transporting | 117 | Expired |
| US6024801A | Method of cleaning and treating a semiconductor device including a micromechanical device | Performing Operations; Transporting | 97 | Expired |
| US5868856A | Method for removing inorganic contamination by chemical derivitization and extraction | Emerging Cross-Sectional Technologies | 83 | Expired |
| US5868862A | Method of removing inorganic contamination by chemical alteration and extraction in a supercritical fluid media | Emerging Cross-Sectional Technologies | 82 | Expired |
| US4711698A | Silicon oxide thin film etching process | Chemistry; Metallurgy | 75 | Expired |
| US4920073A | Selective silicidation process using a titanium nitride protective layer | Emerging Cross-Sectional Technologies | 59 | Expired |
| US5520992A | Electrodes for high dielectric constant materials | Emerging Cross-Sectional Technologies | 59 | Expired |
| US4690729A | Tapered trench process | Emerging Cross-Sectional Technologies | 52 | Expired |
| US5238529A | Anisotropic metal oxide etch | Electricity | 51 | Expired |
| US5100499A | Copper dry etch process using organic and amine radicals | Electricity | 50 | Expired |
| US5431774A | Copper etching | Electricity | 46 | Expired |
| US5122225A | Selective etch method | Electricity | 44 | Expired |
| US4882008A | Dry development of photoresist | Physics | 42 | Expired |
| US4984039A | Tapered trench structure and process | Electricity | 40 | Expired |
| US4702795A | Trench etch process | Emerging Cross-Sectional Technologies | 37 | Expired |
| US4675073A | Tin etch process | Electricity | 35 | Expired |
| US4957590A | Method for forming local interconnects using selective anisotropy | Electricity | 34 | Expired |
| US5238530A | Anisotropic titanate etch | Electricity | 34 | Expired |
| US5584938A | Electrostatic particle removal and characterization | Emerging Cross-Sectional Technologies | 31 | Expired |
| US4863559A | Method for forming local interconnects using chlorine bearing agents | Electricity | 28 | Expired |
| US4758305A | Contact etch method | Emerging Cross-Sectional Technologies | 28 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.