CVD of metals capable of receiving nickel or alloys thereof using iodide
US5869134A · kind A · utility
14Cited by
6References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 21, 1996 |
| Grant date | Feb 9, 1999 |
| Priority date | — |
| Expiry date | Jun 21, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12965
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention discloses a CVD (Chemical Vapor Deposition) process where nickel or alloys thereof, such as, Ni/Cu, Ni/Co, are deposited on metal surfaces which are capable of receiving nickel or alloys thereof, using an Iodide source, preferably an Iodide salt, such as, Copper Iodide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.