Waterborne photoresist emulsions and methods of preparation thereof
US5869220A · kind A · utility
9Cited by
29References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 6, 1997 |
| Grant date | Feb 9, 1999 |
| Priority date | — |
| Expiry date | Jun 6, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/112
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Highly versatile stable photoresist emulsions can be prepared using low levels of neutralization while minimizing the use of surfactants and associative thickeners. High solids, low viscosity waterborne photoresist emulsion compositions are prepared by mixing and comminuting a partially neutralized acid functional latex polymer resin with photopolymerizable monomers and photoinitiators under conditions sufficient to produce a stable emulsion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.