John Scott Hallock
17Patents
11h-index
17Co-inventors
61Inventor score
Filing activity: Oct 15, 1993 → Oct 9, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6709807B2 | Process for reducing edge roughness in patterned photoresist | Emerging Cross-Sectional Technologies | 182 | Expired |
| US5496682A | Three dimensional sintered inorganic structures using photopolymerization | Emerging Cross-Sectional Technologies | 94 | Expired |
| US6387461B1 | Oxygen scavenger compositions | Emerging Cross-Sectional Technologies | 41 | Expired |
| US6503693B1 | UV assisted chemical modification of photoresist | Physics | 23 | Expired |
| US6582891B1 | Process for reducing edge roughness in patterned photoresist | Emerging Cross-Sectional Technologies | 19 | Expired |
| US5981147A | Stable, ionomeric photoresist emulsion and process of preparation and use thereof | Electricity | 18 | Expired |
| US6524936B2 | Process for removal of photoresist after post ion implantation | Physics | 15 | Expired |
| US5941037A | Oxygen scavenging hydrotalcite and compositions containing same | Chemistry; Metallurgy | 12 | Expired |
| US6007885A | Oxygen scavenging compositions and methods for making same | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6734120B1 | Method of photoresist ash residue removal | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6172147A | Additive for production of highly workable mortar cement | Chemistry; Metallurgy | 11 | Expired |
| US5782972A | Additive for production of highly workable mortar cement | Chemistry; Metallurgy | 10 | Expired |
| US5869220A | Waterborne photoresist emulsions and methods of preparation thereof | Emerging Cross-Sectional Technologies | 9 | Expired |
| US5508141A | Autodeposition emulsion and methods of using thereof to selectively protect metallic surfaces | Electricity | 8 | Expired |
| US6258883A | Oxygen scavenging system and compositions | Chemistry; Metallurgy | 5 | Expired |
| US5919602A | Photocurable composition based on acid functional primary resinous mercaptans | Physics | 3 | Expired |
| US5925719A | Photoresist developable in aqueous base made from acid-functional .beta.-hydroxy thiol resin | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.