Methods of manufacturing micro-lens array substrates for implementation in flat panel display
US5871653A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 20, 1997 |
| Grant date | Feb 16, 1999 |
| Priority date | — |
| Expiry date | Feb 20, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8063
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Three process flows for manufacturing the micro-lens array substrates are disclosed. The process flows consist of two main parts. The first part of the process flows involves fabrication of a master mold. The first two process flows utilize photolithography means to print and dry etch the micro-lens array pattern on the substrate, which is covered by a oxidation or a wet etch stopping layer. The desired surface curvature corresponding to the desired size, shape, and pattern of the micro-lens array is created by either oxidizing the exposed silicon layer (in the first process flow) or to wet-etch the exposed SiO2 by using HF solutions (in the second process flow). The third process flow creates damaged areas by using a focused laser light at first. Then, the damaged areas are preferably etched by solutions, leaving the desired surface curvature. The second part of the process flows uses the master mold to make the secondary molds and third molds, and finally micro-lens array substrate through the conventional processes. Two applications of the micro-lens array substrates into flat panel display are also disclosed. First, to achieve wider viewing angle, higher resolution, higher brig…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.