Method of electroplating a substrate, and products made thereby
US5873992A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1997 |
| Grant date | Feb 23, 1999 |
| Priority date | — |
| Expiry date | Mar 24, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D5/605
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is an electroplating method and products made therefrom, which in one embodiment includes using a current density J.sub.O, to form a conductive metal layer having a surface roughness no greater than the surface roughness of the underlying member. In another embodiment of electroplating a substrate surface having peaks and valleys, the method includes electroplating a conductive metal onto the peaks to cover the peaks with the conductive metal, and into the valleys to substantially fill the valleys with the conductive metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.