Scanning exposure apparatus and method
US5877845A · kind A · utility
Inventor
Key dates
| Filing date | Jul 17, 1997 |
| Grant date | Mar 2, 1999 |
| Priority date | — |
| Expiry date | Jul 17, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scanning exposure apparatus for scan-exposing the image of a mask pattern on a mask onto a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux is provided. The scanning exposure apparatus includes a movable mask stage for holding the mask, a movable substrate stage for holding the substrate, a first detector outputting a first signal indicating the position of the substrate stage, and a second detector outputting a second signal indicating the position of the mask stage. The scanning exposure apparatus further includes a controller processing the first signal to derive a target position of the mask stage, the controller receiving the second signal to derive a deviation of the mask stage from the target position, the controller further deriving an error anticipation signal in accordance with deviations in mask stage movement measured in advance of scan-exposure, and a mask stage controller for moving the mask stage in accordance with the derived deviation of the mask stage from the target position and the error anticipation signal to maintain the position of the mask stage to the target position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.