Patent · US Expired

Method and device for wet-processing substrates in a vessel

US5879464A · kind A · utility

4Cited by

1References

18Claims

0Family size

Assignee

Steag Micro Tech GmbH · DE

Inventors

Ludwig Denzler · Keltern, DE
Helmuth Harms-Janssen · Oberderdingen, DE

Key dates

Filing date	Nov 12, 1997
Grant date	Mar 9, 1999
Priority date	—
Expiry date	Nov 12, 2017

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S134/902
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method and device for the wet processing of substrates in a container are provided. At least one liquid is introduced via at least one liquid inlet into the container. A liquid overflow device is adapted to float on the surface of the liquid in the container. The overflow device is provided with openings for withdrawing liquid from the container. Accompanied by release or flooding of the substrates disposed in the container, the overflow device, together with the surface of the liquid, drops to below the substrates or is raised from the substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.