Chemically amplified positive resist composition
US5882844A · kind A · utility
31Cited by
7References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 1, 1997 |
| Grant date | Mar 16, 1999 |
| Priority date | — |
| Expiry date | Apr 1, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0757
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polysiloxane having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight average molecular weight of 2,000-50,000, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition has high sensitivity to actinic radiation, is developable with aqueous base to form a resist pattern, and lends itself to fine patterning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.