Maskless lithography using a multiplexed array of fresnel zone plates
US5900637A · kind A · utility
67Cited by
4References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 30, 1997 |
| Grant date | May 4, 1999 |
| Priority date | — |
| Expiry date | May 30, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/704
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An array of Fresnel zone plates is illuminated by parallel beamlets of narrow-band electromagnetic radiation. The individual zone plates focus a significant fraction of the incident radiation to foci on a substrate located at least several micrometers distant. The beamlets are capable of being individually turned on or off by shutters, or by deflecting small mirrors that would otherwise direct a beamlet to its Fresnel zone plate. Pattern generation is accomplished by moving the substrate while multiplexing the individual beamlets on or off.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.