Wafer cleaning apparatus with rotating cleaning solution injection nozzles
US5901716A · kind A · utility
9Cited by
12References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1996 |
| Grant date | May 11, 1999 |
| Priority date | — |
| Expiry date | Dec 18, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A wafer cleaning apparatus includes at least one nozzle fixing tube disposed in a wall of a cleaning bath. A plurality of injection nozzles are arranged on the nozzle fixing tube for spraying a compressed cleaning solution toward the wafer. A rotating device rotates the at least one nozzle fixing tube and the plurality of injection nozzles within a predetermined angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.