X-ray mask and method of fabricating the same
US5905005A · kind A · utility
5Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 14, 1997 |
| Grant date | May 18, 1999 |
| Priority date | — |
| Expiry date | Oct 14, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflection film formed on a membrane of an X-ray mask has an amorphous structure. A patterned X-ray absorber intercepting transmission of X-rays is formed to be in contact with the front surface of the antireflection film. Thus, an X-ray mask having excellent pattern positional accuracy and a method of fabricating the same are obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.