Electron beam exposure apparatus and method of controlling same
US5905267A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 11, 1997 |
| Grant date | May 18, 1999 |
| Priority date | — |
| Expiry date | Jun 11, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3026
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multi-electronic beam electron beam exposure apparatus in which the patterns exposed by electron beams can be connected with a high degree of reliability. An electron beam exposure method includes steps of causing a plurality of electron beams to impinge upon a substrate at positions that differ from one another, deflecting each electron beam in an element exposure area of each electron beam, wherein the element exposure area is decided by a deflector of the electron beams, and individually controlling irradiation of the substrate by the electron beams, whereby a pattern is exposed in a plurality of the element exposure areas on the substrate. The method further includes a step of controlling the plurality of electron beams by the deflector in such a manner that exposure areas overlap at portions where the element exposure areas are contiguous.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.