Dual-laser voltage probing of IC's
US5905577A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 1997 |
| Grant date | May 18, 1999 |
| Priority date | — |
| Expiry date | Mar 15, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/311
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A probe beam is used to sample the waveform on an IC device under test (DUT) during each cycle of a test pattern applied to the DUT. A reference laser beam is also used to sample the DUT. For each cycle of the test pattern, the reference and probe beams sample the DUT at the same physical location, but at displaced times with respect to each other. Each reference measurement is made at a fixed time relative to the test pattern while the probe measurements are scanned through the test-pattern time portion of interest, in the manner normal to equivalent time sampling, to reconstruct the waveform. For each test cycle, the ratio of these two measurements is taken. The fluctuations of these ratios due to noise is greatly reduced as compared to fluctuations of the probe measurements taken alone. Thus, a smaller number of averages is required to reconstruct the waveform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.