Positioning apparatus, exposure apparatus and method of manufacturing semiconductor device
US5907390A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 30, 1997 |
| Grant date | May 25, 1999 |
| Priority date | — |
| Expiry date | Sep 30, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Positioning accuracy of a scanning stage is improved as a result of reducing error by reducing a non-uniformity in the temperature of air on an optical path of length measurement of the stage. An apparatus for measuring the position of a reticle stage and adjusting the position of the stage based upon the results of measurement includes a reflecting mirror secured to the stage, an interferometer for measuring the distance between a reference position and the reflecting mirror using light, and an air conditioner for supplying a temperature-regulated air stream to an optical path of length measurement connecting the reference position and the reflecting mirror, the air stream being supplied at a speed higher than the speed at which the stage is scanned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.