Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof
US5908720A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 11, 1996 |
| Grant date | Jun 1, 1999 |
| Priority date | — |
| Expiry date | Oct 11, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133512
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition for forming light shielding films comprising a mixture of; 10 to 60 parts by weight of a high molecular weight polymeric binder; 15 to 50 parts by weight of a photopolymerizable monomer; 0.1 to 30 parts by weight of a photopolymerization initiator; and at least 20 parts by weight of a light shielding pigment comprising carbon black coated with resin for forming black matrices such as CRT displays and liquid crystal panels; a black matrix made from by said photosensitive resin composition; and a method for producing said black matrix comprising the steps of coating said photosensitive resin composition comprising a high molecular weight polymeric binder, a photopolymerizable monomer, a photopolymerization initiator, and a light shielding pigment consisting of carbon black coated with resin on a substrate, selectively radiating an activated beam, and developing the coating using an alkaline aqueous solution to form a pattern. The blackmatrix maintains high image contrast, and excels in electric insulation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.