Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom
US5910559A · kind A · utility
4Cited by
6References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1996 |
| Grant date | Jun 8, 1999 |
| Priority date | — |
| Expiry date | Dec 18, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G8/12
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.