Method of determining the radiation dose in a lithographic apparatus
US5910847A · kind A · utility
26Cited by
1References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1997 |
| Grant date | Jun 8, 1999 |
| Priority date | — |
| Expiry date | Feb 18, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70675
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for forming a pattern on a substrate (w), either or not via a mask pattern (c), are described. The radiation dose can be measured accurately and reliably by measuring a latent image of a new, asymmetrical test mark (TM) by means of an optical alignment device present in the apparatus or associated therewith, this latent image being formed by means of production radiation (PB) in the radiation-sensitive layer on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.