Projection exposure method and apparatus therefor
US5917581A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 6, 1996 |
| Grant date | Jun 29, 1999 |
| Priority date | — |
| Expiry date | Dec 6, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method for exposure by projection, having the step of determining an error in magnification of a projection optical system in a position at each of plural image heights of an image, a projection optical system being for projecting an image of a pattern of a mask onto a photosensitizable substrate; and the step of correcting a magnification of projection of the image of the pattern of the mask onto said photosensitizable substrate on the basis of the error in magnification determined in the previous step. Further disclosed is a projection exposure apparatus so adapted as to implement of the method for exposure by projection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.