Photocurable composition based on acid functional primary resinous mercaptans
US5919602A · kind A · utility
3Cited by
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29Claims
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Key dates
| Filing date | Jun 19, 1997 |
| Grant date | Jul 6, 1999 |
| Priority date | — |
| Expiry date | Jun 19, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Acid functional primary thiols having no hydroxy substituents in the beta position, and also having aromatic backbones, can be combined with unsaturated resins to make aqueous base-developable, photoimaging compositions such as solder masks and resists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.