Projection exposure apparatus
US5920378A · kind A · utility
22Cited by
8References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 1997 |
| Grant date | Jul 6, 1999 |
| Priority date | — |
| Expiry date | May 9, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.