Process for the preparation of aluminum oxide film using dialkylaluminum alkoxide
US5922405A · kind A · utility
7Cited by
2References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 29, 1998 |
| Grant date | Jul 13, 1999 |
| Priority date | — |
| Expiry date | May 29, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/403
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An aluminum oxide film is economically and conveniently deposited on a substrate by a process which comprises vaporizing a dialkylaluminum alkoxide compound at a temperature ranging from 0 to 25.degree. C. and contacting the resulting vapor with said substrate heated to a temperature ranging from 300 to 600.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.