Scanning-type exposure apparatus including a vertically disposed holder surface and method thereof
US5923409A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 1997 |
| Grant date | Jul 13, 1999 |
| Priority date | — |
| Expiry date | Aug 25, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1303
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a scanning-type exposure apparatus, a mask and a light-sensitive substrate are disposed substantially vertically in opposed relation to each other, with an optical projection system disposed between the mask and the substrate. Optical projection system includes a plurality of optical elements for projecting an equal-size, erected image of a mask pattern onto the light-sensitive substrate, and these optical elements are arranged in a predetermined direction. A scanning device scanningly moves the mask and the light-sensitive substrate in synchronism with each other relative to the optical projection system in a direction which is perpendicular to both of the predetermined direction and an optical axis of the optical projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.