Method for automatically eliminating three way intersection design conflicts in phase edge, phase shift designs
US5923562A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1996 |
| Grant date | Jul 13, 1999 |
| Priority date | — |
| Expiry date | Oct 18, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method automatically locates and eliminates the most frequently encountered phase conflict in phase edge phase shift mask (PSM) designs used in the manufacture of VLSI circuits. The process is implemented as an automatic CAD routine that locates and widens one leg of a three way intersection to avoid phase conflicts. CAD and design rule checking techniques are used to first locate and then to resolve design conflicts prior to actually executing the very time consuming phase shift mask design. The original circuit design is manipulated prior to or as part of the design rule checking, allowing the verification of the manipulations made prior to handing the design off to the mask layout and mask data preparation group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.