Lars Liebmann
213Patents
31h-index
171Co-inventors
93Inventor score
Filing activity: Aug 3, 1994 → Aug 30, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5740068A | Fidelity enhancement of lithographic and reactive-ion-etched images by optical proximity correction | Physics | 250 | Expired |
| US6421820B1 | Semiconductor device fabrication using a photomask with assist features | Physics | 249 | Expired |
| US6578190B2 | Process window based optical proximity correction of lithographic images | Physics | 244 | Expired |
| US6553559B2 | Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions | Physics | 229 | Expired |
| US6993741B2 | Generating mask patterns for alternating phase-shift mask lithography | Physics | 210 | Expired |
| US7115343B2 | Pliant SRAF for improved performance and manufacturability | Physics | 178 | Expired |
| US5807649A | Lithographic patterning method and mask set therefor with light field trim mask | Physics | 129 | Expired |
| US6057063A | Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith | Physics | 114 | Expired |
| US8225255B2 | Placement and optimization of process dummy cells | Emerging Cross-Sectional Technologies | 105 | Active |
| US8103983B2 | Electrically-driven optical proximity correction to compensate for non-optical effects | Physics | 100 | Active |
| US5537648A | "Geometric autogeneration of ""hard"" phase-shift designs for VLSI" | Emerging Cross-Sectional Technologies | 99 | Expired |
| US6083275A | Optimized phase shift design migration | Physics | 95 | Expired |
| US5923566A | Phase shifted design verification routine | Physics | 95 | Expired |
| US5553273A | Vertex minimization in a smart optical proximity correction system | Physics | 86 | Expired |
| US5636131A | "Geometric autogeneration of""hard""phase-shift designs for VLSI" | Emerging Cross-Sectional Technologies | 85 | Expired |
| US5553274A | Vertex minimization in a smart optical proximity correction system | Physics | 84 | Expired |
| US6066180A | Automatic generation of phase shift masks using net coloring | Physics | 76 | Expired |
| US6338922B1 | Optimized alternating phase shifted mask design | Physics | 76 | Expired |
| US5795685A | Simple repair method for phase shifting masks | Physics | 74 | Expired |
| US6185727A | Design verification for asymmetric phase shift mask layouts | Physics | 73 | Expired |
| US5923562A | Method for automatically eliminating three way intersection design conflicts in phase edge, phase shift designs | Emerging Cross-Sectional Technologies | 72 | Expired |
| US5657235A | Continuous scale optical proximity correction by mask maker dose modulation | Physics | 70 | Expired |
| US5932377A | Exact transmission balanced alternating phase-shifting mask for photolithography | Physics | 58 | Expired |
| US6602728B1 | Method for generating a proximity model based on proximity rules | Physics | 51 | Expired |
| US10192819B1 | Integrated circuit structure incorporating stacked field effect transistors | Electricity | 45 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.