Photoresist compositions

US5928818A · kind A · utility

Assignee

• Olin Microelectronic Chemicals, Inc. · US

Inventors

• Carl-Lorenz Mertesdorf · Wetzikon, CH
• Hans-Thomas Schacht · Rheinfelden (Baden), DE
• Norbert Muenzel · Heitersheim, DE
• Pasquale Alfred Falcigno · Yonkers, US

Key dates

• Filing date: Feb 26, 1997
• Grant date: Jul 27, 1999
• Expiry date: Feb 26, 2017

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/106
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR1## in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, methyl or halogen, R.sub.5 and R.sub.6 independently of one another are C.sub.1 -C.sub.6 alkyl, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 independently of one another are hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient ##EQU1## which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10.ltoreq.Q.ltoreq.0.50, are suitable as binders for DUV photoresists of high processing stability and flow resistance.