Fractionated novolak resin copolymer and photoresist composition therefrom
US5928836A · kind A · utility
5Cited by
4References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1997 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | Sep 29, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.