Sunit S. Dixit
17Patents
7h-index
20Co-inventors
62Inventor score
Filing activity: Dec 12, 1980 → Aug 12, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4943511A | High sensitivity mid and deep UV resist | Physics | 28 | Expired |
| US4920028A | High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone | Physics | 20 | Expired |
| US4399243A | Cleaner and scratch remover composition | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5225312A | Positive photoresist containing dyes | Physics | 9 | Expired |
| US5739265A | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Physics | 9 | Expired |
| US5693749A | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Chemistry; Metallurgy | 8 | Expired |
| US6106995A | Antireflective coating material for photoresists | Physics | 8 | Expired |
| US5182184A | Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom | Physics | 7 | Expired |
| US5928836A | Fractionated novolak resin copolymer and photoresist composition therefrom | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5208138A | High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content | Physics | 5 | Expired |
| US5130409A | Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists | Physics | 3 | Expired |
| US4400481A | Finisher and preserver for lithographic plates | Performing Operations; Transporting | 3 | Expired |
| US5719004A | Positive photoresist composition containing a 2,4-dinitro-1-naphthol | Physics | 3 | Expired |
| US5853947A | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate | Physics | 2 | Expired |
| US4997734A | Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate | Physics | 2 | Expired |
| US4996122A | Method of forming resist pattern and thermally stable and highly resolved resist pattern | Physics | 2 | Expired |
| US5976761A | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.