Position detection apparatus, electron beam exposure apparatus, and methods associated with them
US5929454A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 11, 1997 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | Jun 11, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31774
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The position of an alignment mark is accurately detected independently of distortion of the sectional structure of the alignment mark or the coating state of a resist that covers the alignment mark. This invention provides a position detection apparatus for detecting the position of an alignment mark formed on an object using an electron beam, which has an element electron optical system array (3) for irradiating electron beams onto the object in a matrix, and a deflector (6) for deflecting the plurality of electron beams. The deflector (6) scans the plurality of electron beams on the alignment mark, a reflected electron detector (9) synthesizes and detects reflected electrons or secondary electrons from the alignment mark upon scanning, and the position of the alignment mark is determined on the basis of the displacement amount of the electron beams and the detection result.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.