Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate
US5929973A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1996 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | Oct 22, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a double-side exposure apparatus having a substrate holder for holding a photosensitizable substrate; a first exposure system containing a first light source, a first illumination unit for striking a ray of light emitted from the first light source in a first mask, and a first projection optical unit for projecting an image of the first mask onto a front surface of the photosensitizable substrate; and a second exposure system, mounted at the side opposite to the first exposure system, containing a second light source, a second illumination unit for striking a ray of light emitted from the first light source in a second mask, and a second projection optical unit for projecting an image of the second mask onto a back surface of the photosensitizable substrate; wherein the pattern of the first mask is exposed to the front surface of the photosensitizable substrate and the pattern of the second mask is exposed to the back surface thereof substantially simultaneously with exposure of the pattern of the first mask to the front surface thereof. Also, further disclosed is an exposing method for exposure of both surfaces of a substrate with the double-side exposure apparatus ha…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.