Obliquely deposited film element
US5932354A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jul 11, 1997 |
| Grant date | Aug 3, 1999 |
| Priority date | — |
| Expiry date | Jul 11, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/3033
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
By providing a normally deposited layer as a buffer layer between a substrate and an obliquely deposited layer, it is possible to prevent contaminants on the substrate from diffusing into the obliquely deposited layer. Also, by providing a normally deposited layer as a passivation layer on the uppermost obliquely deposited layer, absorption of water vapor in the air by the obliquely deposited layer is prevented. Further, by forming a laminated object comprising obliquely deposited layers and dense normally deposited layers, strength of each obliquely deposited layer itself is increased and relaxation of its columnar structure can be suppressed with certainty because both the diffusion of contaminants from the substrate and the absorption of water in the air is prevented. Thus, by removing factors to accelerate the relaxation of columnar structure in the obliquely deposited layer, clouding of the obliquely deposited film layer can be prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.