Process for making a photoactive compound and photoresist therefrom
US5936071A · kind A · utility
0Cited by
41References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 2, 1998 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Feb 2, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/023
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides for process of preparing a photoactive ester compound of high purity using a solid base catalyst, preferably an anionic exchange resin. The invention further provides for preparing and imaging a photosensitive composition comprising such a photoactive compound, a film-forming resin and a solvent composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.